6" wafer compatible, shower-head type reactor
RF Plasma
Chalcogenide / Oxychalcogenide Materials
8" wafer compatible, shower-head type, CVD-ready blockerplate
RF Plasma
Oxide Materials
1-300 amu
Dual detector system (Faraday and Secondary Electron Multiplier)
Detection limit: (Partial pressure) < 2E-11 Torr, (Concentration) < 15 ppb
400/660 MHz Pulse / Pattern generation